Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO <sub>4</sub> -precursor and H <sub>2</sub> -plasma

Publication Type:

Journal Article

Source:

J. Mater. Chem. C, Volume 3, Issue 19, p.4848 - 4851 (2015)

URL:

http://xlink.rsc.org/?DOI=C5TC00751H
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