Journal papers

Found 191 results
Author Title Type [ Year(Desc)]
2000
Ballistic electron emission microscopy studies of the temperature dependence of Schottky barrier height distribution in CoSi2/n-Si(100) diodes formed by solid phase reaction, Zhu, S. Y., Qu X. P., Vanmeirhaeghe R. L., Detavernier Christophe, Ru G. P., Cardon F., and Li B. Z. , Solid-State Electronics, Dec, Volume 44, Number 12, p.2217-2223, (2000)
Barrier height inhomogeneities of epitaxial CoSi2 Schottky contacts on n-Si (100) and (111), Zhu, S. Y., Vanmeirhaeghe R. L., Detavernier Christophe, Cardon F., Ru G. P., Qu X. P., and Li B. Z. , Solid-State Electronics, Apr, Volume 44, Number 4, p.663-671, (2000)
A BEEM study of Schottky barrier height distributions of ultrathin CoSi2/n-Si(100) formed by solid phase epitaxy, Zhu, S. Y., Detavernier Christophe, Vanmeirhaeghe R. L., Qu X. P., Ru G. P., Cardon F., and Li B. Z. , Semiconductor Science and Technology, Apr, Volume 15, Number 4, p.349-356, (2000)
CoSi2 formation in the Ti/Co/SiO2/Si system, Detavernier, Christophe, Vanmeirhaeghe R. L., Cardon F., Maex K., Bender H., and Zhu S. Y. , Journal of Applied Physics, Jul 1, Volume 88, Number 1, p.133-140, (2000)
Electrical characteristics of CoSi2/n-Si(100) Schottky barrier contacts formed by solid state reaction, Zhu, S. Y., Detavernier Christophe, Vanmeirhaeghe R. L., Cardon F., Ru G. P., Qu X. P., and Li B. Z. , Solid-State Electronics, Oct, Volume 44, Number 10, p.1807-1818, (2000)
Growth of patterned thin epitaxial CoSi2-films by a titanium oxide mediated epitaxy process, Kluth, P. C., Detavernier Christophe, Zhao Q. T., Xu J., Bochem H. P., Lenk S., and Mantl S. , Thin Solid Films, Dec 22, Volume 380, Number 1-2, p.201-203, (2000)
Influence of mixing entropy on the nucleation of CoSi2, Detavernier, Christophe, Vanmeirhaeghe R. L., Cardon F., and Maex K. , Physical Review B, Nov 1, Volume 62, Number 18, p.12045-12051, (2000)
The influence of Ti capping layers on CoSi2 formation, Detavernier, Christophe, Vanmeirhaeghe R. L., Cardon F., Donaton R. A., and Maex K. , Microelectronic Engineering, Jan, Volume 50, Number 1-4, p.125-132, (2000)
Influence of Ti on CoSi2 nucleation, Detavernier, Christophe, Vanmeirhaeghe R. L., Cardon F., Maex K., Vandervorst W., and Brijs B. , Applied Physics Letters, Nov 13, Volume 77, Number 20, p.3170-3172, (2000)
Ion-bombardment effects on PtSi/n-Si Schottky contacts studied by ballistic electron emission microscopy, Ru, G. P., Qu X. P., Zhu S. Y., Li B. Z., Detavernier Christophe, Vanmeirhaeghe R. L., Cardon F., Donaton R. A., and Maex K. , Journal of Vacuum Science & Technology B, Jul-Aug, Volume 18, Number 4, p.1942-1948, (2000)
Nondestructive characterization of thin silicides using x-ray reflectivity, Detavernier, Christophe, De Gryse R., Vanmeirhaeghe R. L., Cardon F., Ru G. P., Qu X. P., Li B. Z., Donaton R. A., and Maex K. , Journal of Vacuum Science & Technology A, Mar-Apr, Volume 18, Number 2, p.470-476, (2000)
2001
CoSi2 formation through SiO2, Detavernier, Christophe, Vanmeirhaeghe R. L., Cardon F., and Maex K. , Thin Solid Films, May 1, Volume 386, Number 1, p.19-26, (2001)
CoSi2 nucleation in the presence of Ge, Detavernier, Christophe, Van Meirhaeghe R. L., Cardon F., and Maex K. , Thin Solid Films, Mar 15, Volume 384, Number 2, p.243-250, (2001)
The dependence of the etching property of CoSi2 films in diluted HF solutions on the formation conditions, Zhu, S. Y., Ru G. P., Detavernier Christophe, Vanmeirhaeghe R. L., Cardon E., and Li B. Z. , Applied Surface ScienceApplied Surface Science, Jul 2, Volume 178, Number 1-4, p.44-49, (2001)
Electrical characterization of Ar-ion-bombardment-induced damage in Au/Si and PtSi/Si Schottky barrier contacts, Zhu, S. Y., Detavernier Christophe, Vanmeirhaeghe R. L., Cardon F., Blondeel A., Clauws P., Ru G. P., and Li B. Z. , Semiconductor Science and Technology, Feb, Volume 16, Number 2, p.83-90, (2001)
Formation of epitaxial CoSi2 by a Cr or Mo interlayer: Comparison with a Ti interlayer, Detavernier, Christophe, Vanmeirhaeghe R. L., Cardon F., Maex K., Bender H., Brijs B., and Vandervorst W. , Journal of Applied Physics, Feb 15, Volume 89, Number 4, p.2146-2150, (2001)
Nanometer patterning of thin CoSi2-films by application of local stress, Kluth, P., Zhao Q. T., Detavernier Christophe, Xu J., Kappius L., Bay H., Lenk S., and Mantl S. , Microelectronic Engineering, Mar, Volume 55, Number 1-4, p.177-182, (2001)
Orientation-dependent stress build-up during the formation of epitaxial CoSi2, Steegen, A., Detavernier Christophe, Lauwers A., Maex K., Vanmeirhaeghe R. L., and Cardon F. , Microelectronic Engineering, Mar, Volume 55, Number 1-4, p.145-150, (2001)

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