Journal papers

Found 191 results
Author Title Type [ Year(Asc)]
2009
Influence of a transient hexagonal phase on the microstructure and morphological stability of NiSi films, Van Bockstael, C., De Keyser K., Vanmeirhaeghe R. L., Detavernier Christophe, Jordan-Sweet J. L., and Lavoie C. , Applied Physics Letters, Jan 19, Volume 94, Number 3, p.-, (2009)
Interdiffusion and crystallization in HfO2/Al2O3 superlattices, Adelmann, C., Kesters J., Opsomer K., Detavernier Christophe, Kittl J. A., and Van Elshocht S. , Applied Physics Letters, Aug 31, Volume 95, Number 9, p.-, (2009)
Microencapsulation of Moisture-Sensitive CaS:Eu2+ Particles with Aluminum Oxide, Avci, N., Musschoot J., Smet P. F., Korthout K., Avci A., Detavernier Christophe, and Poelman D. , Journal of the Electrochemical Society, Volume 156, Number 11, p.J333-J337, (2009)
Modeling the Conformality of Atomic Layer Deposition: The Effect of Sticking Probability, Dendooven, J., Deduytsche D., Musschoot J., Vanmeirhaeghe R. L., and Detavernier Christophe , Journal of the Electrochemical Society, Volume 156, Number 4, p.P63-P67, (2009)
Ru thin film grown on TaN by plasma enhanced atomic layer deposition, Xie, Q., Jiang Y. L., Musschoot J., Deduytsche D., Detavernier Christophe, Vanmeirhaeghe R. L., Van den Berghe S., Ru G. P., Li B. Z., and Qu X. P. , Thin Solid Films, Jun 30, Volume 517, Number 16, p.4689-4693, (2009)
THE TEXTURE OF THIN NiSi FILMS AND ITS EFFECT ON AGGLOMERATION, De Keyser, K., Detavernier Christophe, Vanmeirhaeghe R. L., Jordan-Sweet J. L., and Lavoie C. , Applications of Texture Analysis, Volume 201, p.3-10818, (2009)
2008
Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N-2 or NH3 plasma, Xie, Q., Musschoot J., Detavernier Christophe, Deduytsche D., Vanmeirhaeghe R. L., Van den Berghe S., Jiang Y. L., Ru G. P., Li B. Z., and Qu X. P. , Microelectronic Engineering, Oct, Volume 85, Number 10, p.2059-2063, (2008)
Effect of Pt addition on growth stress and thermal stress of NiSi films, Van Bockstael, C., De Keyser K., Deduytsche D., Vanmeirhaeghe R. L., Detavernier Christophe, Jordan-Sweet J. L., and Lavoie C. , Journal of Applied Physics, Sep 1, Volume 104, Number 5, p.-, (2008)
The effect of silicon on the interaction between metallic uranium and aluminum: A 50 year long diffusion experiment, Leenaers, A., Detavernier Christophe, and Van den Berghe S. , Journal of Nuclear Materials, Nov 15, Volume 381, Number 3, p.242-248, (2008)
Effects of the barrier metal thickness and hydrogen pre-annealing on the characteristic parameters of Au/n-GaAs metal-semiconductor Schottky contacts, Gullu, O., Biber M., Vanmeirhaeghe R. L., and Turut A. , Thin Solid Films, Sep 1, Volume 516, Number 21, p.7851-7856, (2008)
Epitaxial formation of a metastable hexagonal nickel-silicide, De Keyser, K., Van Bockstael C., Detavernier Christophe, Vanmeirhaeghe R. L., Jordan-Sweet J. L., and Lavoie C. , Electrochemical and Solid State Letters, Volume 11, Number 9, p.H266-H268, (2008)
Formation and stability of NiSi in the presence of Co and Fe alloying elements, Deduytsche, D., Detavernier Christophe, Vanmeirhaeghe R. L., Jordan-Sweet J. L., and Lavoie C. , Journal of Vacuum Science & Technology B, Nov, Volume 26, Number 6, p.1971-1977, (2008)
Growth kinetics and crystallization behavior of TiO2 films prepared by plasma enhanced atomic layer deposition, Xie, Q., Musschoot J., Deduytsche D., Vanmeirhaeghe R. L., Detavernier Christophe, Van den Berghe S., Jiang Y. L., Ru G. P., Li B. Z., and Qu X. P. , Journal of the Electrochemical Society, Volume 155, Number 9, p.H688-H692, (2008)
In-situ X-ray Diffraction study of Metal Induced Crystallization of amorphous silicon, Knaepen, W., Detavernier Christophe, Vanmeirhaeghe R. L., Jordan-Sweet J. L., and Lavoie C. , Thin Solid Films, Jun 2, Volume 516, Number 15, p.4946-4952, (2008)
Nucleation and diffusion during growth of ternary Co1-xNixSi2 thin films studied by complementary techniques in real time, Smeets, D., Demeulemeester J., De Keyser K., Deduytsche D., Detavernier Christophe, Comrie C. M., Theron C. C., Lavoie C., and Vantomme A. , Journal of Applied Physics, Nov 1, Volume 104, Number 9, p.-, (2008)
Pt redistribution during Ni(Pt) silicide formation, Demeulemeester, J., Smeets D., Van Bockstael C., Detavernier Christophe, Comrie C. M., Barradas N. P., Vieira A., and Vantomme A. , Applied Physics Letters, Dec 29, Volume 93, Number 26, p.-, (2008)
The role of lattice mismatch and kinetics in texture development: Co1-xNixSi2 thin films on Si(100), Smeets, D., Vantomme A., De Keyser K., Detavernier Christophe, and Lavoie C. , Journal of Applied Physics, Mar 15, Volume 103, Number 6, p.-, (2008)
Simultaneous real-time x-ray diffraction spectroscopy, Rutherford backscattering spectrometry, and sheet resistance measurements to study thin film growth kinetics by Kissinger plots, Smeets, D., Demeulemeester J., Deduytsche D., Detavernier Christophe, Comrie C. M., Theron C. C., Lavoie C., and Vantomme A. , Journal of Applied Physics, Nov 15, Volume 104, Number 10, p.-, (2008)
Study of metal-related deep-level defects in germanide Schottky barriers on n-type germanium, Simoen, E., Opsomer K., Claeys C., Maex K., Detavernier Christophe, Vanmeirhaeghe R. L., and Clauws P. , Journal of Applied Physics, Jul 15, Volume 104, Number 2, p.-, (2008)
Texture of NiSi films on Si(001), (111), and (110) substrates, Detavernier, Christophe, Jordan-Sweet J. L., and Lavoie C. , Journal of Applied Physics, Jun 1, Volume 103, Number 11, p.-, (2008)
Yttrium silicide formation and its contact properties on Si(100), Huang, W., Ru G. P., Detavernier Christophe, Vanmeirhaeghe R. L., Jiang Y. L., Qu X. P., and Li B. Z. , Microelectronic Engineering, Jan, Volume 85, Number 1, p.131-135, (2008)

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