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Conformal Coating of Nanomaterials
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Author
any
, F M
Aaronson, H I
Absil, P P
Adelmann, C
Aerts, A
Afanas'ev, V V
Agarwal, A
Ahmad, Tareq
Arickx, Pieter
Avci, A
Avci, N
Badylevich, M
Baets, Roel
Baklanov, M R
Baklanov, Mikhail R
Baklanov, Mikhail. R.
Bals, S.
Bals, Sara
Barr, ïssa K. S.
Barradas, N P
Baskes, M I
Bauer, M
Bay, H
Belmonte, Attilio
Bender, H
Bender, Hugo
Berghe, Van S
Berghe, Sven Van
Biber, M
Biermans, Ellen
Biesemans, S
Bladt, E.
Blanpain, B
Blasco, Nicolas
Blomberg, T
Blondeel, A
Bochem, H P
Bosserez, Tom
Botterman, Jonas
Brainis, Edouard
Bras, W.
Bras, Wim
Braun, M
Brijs, B
Brinck, Stephanie ten
Brondeel, L
Bruneel, Els
Buyle, G
Cabral, C
Cai, G
Capon, Boris
Cardon, Ludwig
Cardon, E
Cardon, F
Caymax, M
Caymax, Matty
Chen, T
Chu, P K
Claeys, C
Clauws, P
Clemmen, éphane
Clima, S
Coati, A.
Coia, C
Comrie, C M
Conard, T
Cott, Daire J.
Cromphout, C
D'Haen, J
Damm, Hanne
Dauwe, C
De Baerdemaeker, J
De Dobbelaere, Christopher
De Gryse, R
De Keyser, K.
De Keyser, K
De Meulenaer, B
De Roo, Jonathan
De Schutter, B
De Schutter, B.
De Schutter, Bob
Deduytsche, Davy
Deduytsche, D
Degraeve, R
Deheryan, Stella
Delabie, A
Delabie, Annelies
Demeulemeester, J.
Demeulemeester, J
Demeurisse, C
Dendooven, J.
Dendooven, Jolien
Dendooven, J
Deng, Shaoren
Deng, Shaoren
Desjardins, P
Detavernier, Christophe
Detavernier, C.
Detavernier, C
Detavernier, Christophe
Detavernier, Christophe
Devloo-Casier, Kilian
Devloo-Casier, K
Devulder, W.
Devulder, Wouter
Dewulf, Daan
Dierick, Ruben
Ding, S F
Dobbelaere, Thomas
Dobbelaere, Thomas
Donaton, R A
Donaton, R
Driesen, Kris
Driesen, K
Drijvers, Emile
Egger, W
Elen, Ken
Escrig, J
Espejo, A P
Favia, P
Filez, Matthias
Filippousi, Maria
Fischer, P
Flamee, Stijn
Fonda, Emiliano
Forment, S
Franquet, Alexis
Franquet, A
Furuhara, T
Galvita, Vladimir V.
Gaudet, S
Geenen, F A
Geenen, F A
Geenen, F.A.
Geiregat, Pieter
Geryl, Kobe
Gignac, L M
Gilson, Jean-Pierre
Goeman, Jan
Gooth, J
Goris, Bart
Goux, Ludovic
Govoreanu, B
Grandfield, Kathryn
Griffiths, H
Guha, S
Gullu, O
Haemers, Jo
Haemers, J
Hamed, Heidari M.
Hardy, A
Hardy, An
Harper, J M E
He, Zhanbing
Hens, Z
Hens, Zeger
Hens, Zeger
Hermans, Artur
Hermida-Merino, Daniel
Heyns, M
Hillert, M
Houthoofd, K
Howe, J M
Hu, C K
Huang, W
Huang, A P
Iacopi, F
Ide, Matthias
Infante, Ivan
Jans, Karolien
Jiang, Y L
Jiang, Yulong
Jiang, Yu-Long
Jordan-Sweet, J.
Jordan-Sweet, J.L.
Jordan-Sweet, J. L.
Jordan-Sweet, J
Jurczak, M
Jurczak, Malgorzata
Kaczer, B
Kappius, L
Kauranen, Martti
Kellock, A J
Kelly, P M
Kelly, P M
Kesters, J
Keyser, De K
Kim, H
Kittl, J
Kittl, J A
Kluth, P C
Kluth, P
Knaepen, W.
Knaepen, W
Koranyi, T I
Korthout, K
Koskinen, Kalle
Kuhs, Jakob
Kurttepeli, Mert
Lambert, K
Laughlin, D E
Lauwers, A
Lavoie, C.
Lavoie, C
Leenaers, A
Leenaers, A
Lekens, G
Lenaerts, Silvia
Lenk, S
Leroy, W P
Leus, Karen
Levrau, Elisabeth
Li, B Z
Lin, Dennis
Lin, D
Liniger, E
Liu, J H
Liu, S Y
Lobato, Ivan
Longrie, D
Longrie, Delphine
Lu, F
Ludwig, Karl F.
Ludwig, Karl F
Ludwig, KF
Ludwig, K.
Ludwig, Karl
Machkaoutsan, V
Maes, J W
Maex, K
Magusin, Pieter C. M. M.
Malhotra, S G
Manger, D
Mantl, S
Marin, Guy B.
Martens, JA
Martens, Johan A
Martens, Koen
Martens, Johan A.
Masschaele, Kasper
Mattelaer, Felix
Meersschaut, J
Meersschaut, Johan
Meledina, Maria
Menou, N
Mestdagh, F J
Minjauw, Matthias
Minjauw, Matthias M.
Moelans, N
Moens, F
Muddle, B C
Mullens, J
Muller, Robert
Musschoot, J
Nielsch, K
Noyan, C
Nyns, L
Opsomer, Karl
Opsomer, K
Ozcan, A S
Park, D G
Pawlak, M A
Perkisas, T.
Peys, Nick
Pierreux, D
Poate, J
Poelman, Dirk
Poelman, H
Poelman, Hilde
Poelman, D
Polspoel, W
Pond, R C
Popovici, M
Portale, G.
Pourtois, G
Premkumar, Peter Antony
Pulinthanathu Sree, S
Purdy, G
Qu, Xinping
Qu, Xin-Ping
Qu, X P
Radu, Iuliana
Ragaert, Kim
Ramachandran, Ranjith K.
Ramachandran, Ranjith
Rampelberg, Geert
Rampelberg, G
Reynolds, W T
Richard, O
Rongé, Jan
Ross, F M
Rossnagel, S
Rossnagel, S M
Rothschild, A
Roy, Amit K
Ru, G P
Santinacci, Lionel
Santos, N. M.
Schaekers, Marc
Schaekers, Marc
Schaekers, M
Schrauwen, A.
Segers, D
Seidel, Felix
Seo, J W
Shiflet, G J
Simoen, E
Simon, A
Smeets, D
Smet, Philippe F.
Smet, P F
Soffa, W A
Solano, Eduardo
Sperr, P
Sree, SP
Sree, Sreeprasanth Pulinthanathu
Sree, Sreeprasanth Pulinthana
Sree, Sreeprasanth Pulinthana
Srinivasan, G R
ST Vandenbroucke, Sofie
Stach, E A
Stakenborg, Tim
Steegen, A
Straten, O
Swerts, J
Tahir, Norini
Taulelle, Francis
Temst, K
Tersoff, J
Theron, C C
Thomas, Karine
Thomas, S G
Toeller, Michael
Tomida, K
Torregiani, C
Tu, K N
Turner, Stuart
Turut, A
Van Bael, Marlies
Van Bael, Marlies K.
Van Bael, M K
Van Bockstael, C
Van de Kerckhove, Kevin
Van den Berghe, S
Van den Berghe, Sven
Van den Rul, H
Van der Eycken, Johan
Van Der Voort, Pascal
Van Elshocht, S
Van Elshocht, Sven
Van Genechten, Dirk
Van Houdt, J
Van Hove, Robbert
Van Meirhaeghe, R L
Van Peteghem, C
Van Poucke, C
van Stiphout, K.
van Stiphout, Koen
van Tendeloo, Gustaaf
Vanbutsele, G
Vandervorst, W
Vandervorst, Wilfried
Vanmeirhaeghe, R L
Vanstreels, K
Vantomme, Andre
Vantomme, A.
Vantomme, A
Vasudevan, V K
Verbruggen, Sammy W.
Verdonck, Patrick
Vereecken, P M
Vereecken, Philippe M.
Vereecken, Philippe
Verleysen, E
Vieira, A
Voort, Pascal Van Der
Vos, Rita
Vrancken, C
Walravens, Willem
Wang, X P
Wouters, D J
Wouters, D
Xie, Qi
Xie, Q
Xu, J
Zahid, M
Zhang, W Z
Zhang, M X
Zhao, Q T
Zhu, S Y
Zhu, S
Zierold, R
Type
any
Journal Article
Term
any
PublicationTag - ALD - conformality
PublicationTag - ALD - in situ characterisation at CoCooN lab
PublicationTag - ALD - in situ synchrotron
PublicationTag - ALD - nanoporous materials
PublicationTag - ALD - new developed proces
PublicationTag - ALD - powders
PublicationTag - Application: battery cells
PublicationTag - Application: contacting materials (silicides, germanides)
PublicationTag - Application: memory cell
PublicationTag - Application: solar cell
PublicationTag - Characterisation - in situ xrd
PublicationTag - Characterisation - Texture
PublicationTag - Deposition - ALD
PublicationTag - Deposition - combinatorial sputtering
Year
any
2019
2018
2017
2016
2015
2014
2013
2012
2011
2010
2009
2008
2007
2006
2005
2004
2003
2002
2001
2000
1999
1998
Keyword
any
(100)si
(111)si
(in situ) X-ray diffraction
45 nm cmos
abnormal grain-growth
acrylamide formation
activation-energy
Ag-Te
agglomeration
al/a-ge bilayer
al2o3
ald
algorithm
alloying
alloying additions
alloys
alumina
aluminium compounds
aluminum
aluminum-induced crystallization
aluminum-oxide
aluminum-silicide reactions
ammonia plasma
amorphous aluminum nitride
amorphous semiconductors
amorphous-silicon
annealing
arrays
atomic force microscopy
atomic layer deposition
atomic-layer deposition
atomic-layer-deposition
Authored by me
axiotaxy
backscattering
ballistic electron emission microscopy
band offsets
barrier height
barrier height inhomogeneity
barrier heights
barrier metal thickness
barrier-height
bazro3
beam epitaxy
beam-assisted deposition
beem
behavior
bilayers
boundary migration
building-blocks
calcium-carbonate
cap
capacitance-voltage
capacitors
capillary instabilities
capping layer
carbon
catalysts
CBRAM
chemical reactions
chemical-vapor-deposition
cmos
cmos applications
co
co-silicide
coating
cobalt
cobalt alloys
cobalt compounds
cobalt germanides
cobalt silicide
cobalt silicides
cobalt-doped germanium
combinatorial deposition
complex
conductance model
conducting probe-afm
constant oxides
contacts
copper
copper diffusion barrier
copper film
copper-germanide
cosi2
cosi2 films
cosi2/si contact
crystal microstructure
crystal orientation
crystal-growth
crystallisation
crystallization
cu electrodeposition
cu films
cu metallization
current-voltage characteristics
damage
damascene trenches
decomposition
deep level defects
deep levels
defect
defects
deposition
devices
diamond
diffusion
diffusion activation energy
diffusion barrier
diffusion barrier systems
diffusion barriers
diffusion mechanisms
diodes
dioxide
disilicides
dispersion fuel
dlts
dram
ebsd
effective core potentials
electrical conductivity transitions
electrical resistivity
electrical-properties
electrical-transport
electrodes
electroluminescent
electron backscattering
electron diffraction
electron-emission microscopy
electron-transport
electronic states (localized)
electronic-properties
electronics
electroplated copper
elemental semiconductors
elements
ellipsometric porosimetry
enhanced formation
enhancement
entropy
epitaxial cosi2
epitaxial cosi2 film
epitaxial nisi2
epitaxial yttrium silicide
epitaxial-growth
epitaxy
er
erbium silicide
etching
evaporated silicon
evolution
expansion
fabrication
ferroelectricity
fiber texture
film
film growth
film stability
films
flash
food
free radicals
fully silicided gates
gaas
gap
gate
gate dielectrics
ge
ge crystals
ge(100)
germanidation
germanium
germanium alloys
gold
grain boundaries
grain size
grain-growth
graphite
growth
h2o
height
height inhomogeneities
hfo2
hfsion
high-k
high-temperature
hydrogen pre-annealing
hydrogen-terminated silicon
i-v-t
ideality factors
impurities
in situ curvature measurements
in situ xrd
in-situ
in-situ xrd
induced stress
induced-lateral-crystallization
inheritance
inhomogeneities
inhomogeneity
inplane texture
insulator transition
interconnects
interface
interface states
interfaces
interfacial reaction pathways
interfacial reactions
interlayer
intermetallic compounds
ion
ir
iridium silicides
iron alloys
iron disilicide
Iron phosphate
irradiation-induced defects
island growth
isopropoxide
kappa gate dielectrics
kinetics
lateral diffusion couple
layer
layer exchange
layers
lc-ms/ms
lifetime
light-emitting diode
light-emitting-diodes
linear correlation
liquid-solid method
low-temperature formation
magnetron-sputtered v2o5
marker
mechanical stress
mechanism
mechanisms
mediated crystallization
memory
metal
metal rich phase
metal silicides
metal-rich phases
metal-semiconductor contact
metal-semiconductor interfaces
metallic thin films
metallization
mic
microcrystalline silicon
microscopy
microstructure
misfit dislocations
mixing entropy
mo2c
model
modeling
molecular calculations
monosilicide
morphology
mos capacitors
mosfets
mu-m
n thin-films
n-type
n-type silicon
nanocrystals
nanopatterning
neutron reflectometry
ni
ni silicide
ni-based silicides
ni-si
ni-si system
ni-silicide
ni-silicides
ni/si
ni2si
ni31si12
nickel
nickel alloys
nickel compounds
nickel silicide
nickel silicide formation
nickel silicides
nickel-germanium
nickel-silicide
niobium
nisi
nisi2
nisi2 thin-films
nucleation
ohmic contacts
oil type
optical-properties
oxidation
oxide
oxide thin-films
oxide-mediated epitaxy
oxides
oxygen
oxygen contamination
ozone
patterning
performance
phase
phase formation
phase transformations
phase-formation
phase-separation
phases
phosphors
photocatalytic lithography
photoluminescence
plasma
plasma cvd
platinum alloys
polefigures
poly-si
polycrystalline
polycrystalline diamond
postirradiation examination
potatoes
powders
precursor
pressure
probability
pulsed-laser deposition
pure germanium
PVD
quadrupole mass-spectrometry
quartz-crystal microbalance
reaction kinetics
reaction paths
reaction pathway
reactive diffusion
recrystallization
rectifiers
resistance measurements
resistive memory
resistivity
room temperature grain growth
rta
ru
ru thin-films
ruthenium
rutherford backscattering
rutherford backscattering data
rutherford backscattering spectrometry
scale
scanning electron microscopy
scattering
schottky barrier
schottky barrier diode
schottky barrier height
schottky barrier height inhomogeneities
schottky barriers
schottky contacts
schottky diode
schottky source/drain
schottky-barrier
schottky-barrier height
self-diffusion
self‐assembled monolayers
semiconductor thin films
semiconductors
sequence
si
si(001)
si(100)
si(111)
sige
silane
silicate
silicidation
silicide
silicide formation
silicides
silicon
silicon alloys
silicon nanowires
silicon oxide
silicon thin-films
silicon-germanium
silicon-on-insulator
silver
single-crystal
slow positron annihilation
solar-cells
solid phase epitaxy
solid solubility
solid state reaction
solid-phase reaction
source/drain
spectroscopy
sputter deposition
srtio3
srtio3 thin-films
stability
step-coverage
stress relaxation mechanisms
substrate
substrate-temperature
substrates
sulfide
surface
surface recombination
surface texture
surfaces
surfaces and interfaces
system
systems
ta
tacn
tan
tantalum
tantalum carbide
tatalum nitride
technologies
technology
temperature
temperature coefficient
temperature-dependence
texture
thermal stability
thermal-expansion
thermal-stability
thin
thin film
thin films
thin-film reactions
thin-films
ti
ti capping
ticl4
tin
tio2 films
tisi2
titanium capping layer
titanium dioxide
titanium nitride
titanium silicide
titanium-dioxide
transformation
transient spectroscopy
transistors
transition-metal carbides
transition-metals
transmission electron microscopy
transmission electron-microscopy
transport
tungsten carbide
twin
vacuum
vapor-deposition
voltage
water
work function
x-ray diffraction
x-ray-diffraction
xrd
yttrium silicide
zone model
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